基于微元材料去除模型的单摆抛光平面度预测

李凯旋; 李军; 熊光辉; 吴成; 于宁斌; 高秀娟

doi:10.13394/j.cnki.jgszz.2021.0116

基于微元材料去除模型的单摆抛光平面度预测

doi: 10.13394/j.cnki.jgszz.2021.0116

南京航空航天大学机电学院, 南京 210016

基金项目: 国家自然科学基金联合基金（U20A20293）；国家自然科学基金面上项目（52075318）；江苏省“六大人才高峰”高层次人才项目（JXQC-010）；南京航空航天大学研究生创新基地开放基金（KFJJ20200503）

详细信息

作者简介:
李凯旋，男，1997年生，硕士研究生。主要研究方向：精密和超精密加工。E-mail：lkx15850565923@163.com

通讯作者:
李军，男，1979年生，博士、教授。主要研究方向：精密超精密加工、固结磨料研磨抛光。E-mail: junli@nuaa.edu.cn

中图分类号: TG580.692
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出版历程
- 收稿日期: 2021-11-22
- 修回日期: 2021-12-20
- 录用日期: 2021-12-22
- 刊出日期: 2022-05-27

Flatness prediction of single pendulum polishing based on microelement material removal model

College of Mechanical and Electrical Engineering, Nanjing University of Aeronautics and Astronautics, Nanjing 210016, China

摘要

摘要: 为探究单摆参数对抛光工件平面度的影响，提出一种基于速度和压强分布耦合的抛光微元材料去除模型，以预测工件表面平面度。从单颗磨粒的材料去除出发，建立工件表面各微元单位时间内材料去除厚度模型，并将工件相对抛光垫速度和工件表面压强分布耦合代入模型；根据工件初始面形提取微元高度值，结合各微元材料去除的厚度，计算抛光后的工件表面平面度；试验验证平面度预测方法。结果表明：仿真与实际抛光后的面形的变化趋势相同，平面度PV₂₀值绝对偏差小于12.0%，平面度预测可靠。
- 单摆抛光 /
- 表面微元 /
- 速度分布 /
- 压力分布 /
- 平面度预测
Abstract: A microelement material removal model was proposed to explore the influence of single pendulum parameters on the polishing flatness of workpiece. Based on the coupling of velocity and pressure distribution, the model could predict the polishing flatness. Starting from the material removal of single abrasive particle, the model of material removal height of each microelement on the workpiece surface in unit time was established. The velocity of workpiece relative to polishing pad and pressure distribution of workpiece surface was coupled and inserted into the model. According to the initial surface shape of workpiece, the height value of microelement was extracted, and the flatness of the workpiece after polishing was calculated combined with the thickness of microelement material removal. Experiments were carried out to validate the flatness prediction method. The results show that the change trend of the surface shape after simulated polishing is same as actual polishing, and the absolute deviation of flatness PV₂₀ is less than 12.0%. The flatness prediction is reliable.
- single pendulum polishing /
- surface microelement /
- velocity distribution /
- pressure distribution /
- flatness prediction

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图 1 单颗磨粒压入工件表面

Figure 1. Single grain press into workpiece surface

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图 2 抛光垫表面凸起

Figure 2. Surface bulge of polishing pad

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图 3 工件与抛光垫相对运动

Figure 3. Relative motion between workpiece and polishing pad

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图 4 绝对和运动坐标系变换示意图

Figure 4. Transformation diagram of absolute coordinate system and motion coordinate system

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图 5 单摆运动

Figure 5. Single pendulum

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图 6 三维接触模型

Figure 6. Three-dimensional contact model

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图 7 压强提取线Path

Figure 7. Pressure extraction line Path

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图 8 抛光平面度预测实例

Figure 8. Example of predicting polishing flatness

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图 9 单摆偏心距改变验证试验结果

Figure 9. Results of verification experiment by changing single pendulum eccentricity

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图 10 单摆幅度改变验证试验结果

Figure 10. Results of verification experiment by changing single pendulum amplitude

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图 11 单摆偏置角度改变验证试验结果

Figure 11. Results of verification experiment by changing single pendulum bias angle

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表 1 平面度预测工艺参数

Table 1. Process parameters of flatness prediction

参数	数值
单摆幅度2θ / （°）	30
单摆偏心距 e / mm	160
单摆偏置角度 φ / （°）	0
抛光垫转速 ω₁/ (r·min⁻¹)	25
工件转速 ω₂ / (r·min⁻¹)	30
单摆频率 f / (n·min⁻¹)	11
中心加压压强 p / kPa	15
抛光时间 t / min	5

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表 2 验证平面度变化试验的抛光参数

Table 2. Polishing parameters of proving flatness change test

抛光参数	组1	组2	组3
单摆偏心距 e / mm	125，140， 155，170	155	145
单摆幅度2θ / （°）	25	15，20， 25，30	15
单摆偏置角度 φ / （°）	0	0	0，4， 8，12

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表 3 验证平面度变化试验的其他抛光参数

Table 3. Other polishing parameters of proving flatness change test

参数	数值
抛光垫转速 ω₁ / (r·min⁻¹)	20
工件转速 ω₂ / (r·min⁻¹)	25
单摆频率 f / (n·min⁻¹)	10
中心加压压强 p / kPa	11
抛光时间 t / min	10

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