旋转磁场下非球面工件的磁性混合流体抛光

田可; 郭会茹; 吴勇波; 陆政凯

doi:10.13394/j.cnki.jgszz.2021.0211

旋转磁场下非球面工件的磁性混合流体抛光

doi: 10.13394/j.cnki.jgszz.2021.0211

1.
武汉理工大学, 现代汽车零部件技术湖北省重点实验室, 武汉 430070
2.
南方科技大学机械与能源工程系, 广东深圳 518005

基金项目: 国家自然科学基金（51805394，61503290）。

详细信息

作者简介:
郭会茹，女，1985年生，讲师、硕士生导师。主要研究方向：磁场辅助超精密加工。E-mail：guohuiru85@163.com

中图分类号: TG58
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- 被引次数: 0
出版历程
- 收稿日期: 2021-12-23
- 修回日期: 2022-02-22
- 网络出版日期: 2023-02-07
- 刊出日期: 2022-08-10

Magnetic compound fluid polishing of aspheric workpiece under rotating magnetic field

1.
Hubei Key Laboratory of Advanced Technology for Automotive Components, Wuhan University of Technology, Wuhan 430070
2.
Department of Mechanical and Energy Engineering, Southern University of Science and Technology, Shenzhen 518005, Guangdong, China

摘要

摘要: 针对非球面光学元件的结构特点及其表面质量要求，在磁性混合流体抛光基础上，设计并制作以径向充磁永磁体为旋转磁场源的半球头抛光头。首先，通过Ansoft Maxwell磁场仿真，分析对比不同形状、不同尺寸磁体和偏心距下各磁体周围磁场的分布状况，选定直径为10.0 mm、高度为5.0 mm、偏心距为2.5 mm、径向充磁的圆柱形磁体。其次，通过观测并比较不同组成、配方和供应量的磁性混合流体在抛光头上的行为，确定磁性混合流体抛光液成分。最后，采用制备的磁性混合流体抛光液及自制的抛光头对非球面PMMA工件进行抛光试验。经过15 min抛光后，PMMA工件表面质量明显改善，其面型精度R_q由0.703 μm下降到2.433 nm，表面粗糙度R_a由0.545 μm下降到1.786 nm，说明研制的抛光头能实现非球面工件的纳米级抛光。
- 磁性混合流体 /
- 非球面抛光 /
- 磁场优化 /
- 抛光液行为
Abstract: According to the structural characteristics and the surface quality requirements of aspheric optical elements, a hemispherical head polishing head with radial magnetized permanent magnet as rotating magnetic field source is designed and manufactured on the basis of magnetic compound fluid (MCF) polishing. Firstly, through Ansoft Maxwell magnetic field simulation, the distributions of magnetic field around each magnet with different shapes, sizes and eccentricities are analyzed and compared, and the cylindrical magnet with diameter of 10.0 mm, height of 5.0 mm, eccentricity of 2.5 mm and radial magnetization is selected. Secondly, by observing and comparing the behaviors of MCF with different compositions, formula and supplies on the polishing head, the compositions of MCF polishing slurry is determined. Finally, the aspheric PMMA workpiece is polished with the prepared MCF polishing slurry and the self-made polishing head. After polishing for 15 min, the surface quality of the PMMA workpiece is significantly improved, its surface accuracy R_q is decreased from 0.703 μm to 2.433 nm, and the surface roughness R_a is reduced from 0.545 μm to 1.786 nm, indicating that the developed polishing head can realize the nano-polishing of aspheric workpiece.
- magnetic compound fluid (MCF) /
- aspheric polishing /
- magnetic field optimization /
- polishing slurry behavior

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图 1 4种形状磁体下工件表面的磁场仿真

Figure 1. Magnetic field simulation of workpiece surface under four shapes of magnets

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图 2 抛光头与非球面干涉示意图

Figure 2. Schematic diagram of interference between polishing head and aspheric surface

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图 3 不同尺寸磁体下工件表面的磁场分布

Figure 3. Magnetic field distributions on workpiece surface under different sizes of magnet

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图 4 磁体旋转不同角度时的相对位置

Figure 4. Relative positions of magnets when rotating at different angles

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图 5 磁体旋转90°和270°时工件表面的磁力线分布

Figure 5. Distribution of magnetic lines of force on workpiece surface when magnet rotate 90° and 270°

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图 6 不同偏心距下铝外壳上的磁感应强度分布仿真结果

Figure 6. Simulation results of magnetic induction intensity distribution on aluminum shells under different eccentricities

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图 7 抛光头及抛光装置

Figure 7. Polishing head and polishing device

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图 8 MCF1和MCF2时的磁性簇分布情况

Figure 8. Distribution of magnetic clusters at MCF1 and MCF2

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图 9 磁体旋转前后不同MCF的分布情况

Figure 9. Distribution of different MCF before and after magnet rotation

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图 10 不同供应量的MCF2抛光液分布情况

Figure 10. Distribution of MCF2 polishing slurry with different supply

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图 11 抛光液形成的磁性簇区域示意图

Figure 11. Schematic diagram of magnetic cluster area formed by polishing slurry

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图 12 工件外观图

Figure 12. Workpiece appearances

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图 13 扫描电子显微镜观测的工件表面形貌

Figure 13. Surface morphology of workpiece observed by SEM

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图 14 Zygo观测的工件表面轮廓及形貌

Figure 14. Workpiece surface profile and morphology observed by Zygo

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表 1 钕铁硼磁体的性能参数

Table 1. Performance parameters of Nd−Fe−B magnet

参数	型号或取值
磁体型号	N35
剩余磁化强度 B_r / T	1.170 0～1.210 0
矫顽力 H_cb / (kA·m⁻¹)	≥868
最大磁能积 (BH)_max / (kJ·m⁻³)	263～287

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表 2 4种磁体的尺寸

Table 2. Four magnet sizes

磁体形状	直径 D / mm	高度 H / mm	其他
轴向充磁圆柱体	10.0	5.0
径向充磁圆柱体	10.0	5.0
轴向充磁环形	10.0	5.0	内径为5.0 mm
轴向充磁半球头	10.0	5.0	轴向长为10.0 mm

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表 3 MCF成分表（质量分数）

Table 3. MCF composition table（mass fraction）

编号	CIPs ω₁ / %	APs ω₂ / %	MF ω₃ / %	α−纤维素 ω₄ / %
MCF1	58	12	30	0
MCF2	58	12	27	3
MCF3	53	12	32	3
MCF4	48	12	37	3
MCF5	43	12	42	3

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表 4 抛光工艺参数

Table 4. Polishing process parameters

参数	取值
磁体偏心距 e / mm	2.5
铝外壳转速 n_c / (r·min⁻¹)	500
磁体转速 n_m / (r·min⁻¹)	1 000
MCF供应量 V / mL	0.7
加工间隙 Δ / mm	1.0
抛光时间 t / min	15

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