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双磨粒划擦2D SiCf/SiC复合材料实验

郭晋竹 刘瑶 王优哲 王栋

郭晋竹, 刘瑶, 王优哲, 王栋. 双磨粒划擦2D SiCf/SiC复合材料实验[J]. 金刚石与磨料磨具工程, 2025, 45(2): 153-162. doi: 10.13394/j.cnki.jgszz.2024.0044
引用本文: 郭晋竹, 刘瑶, 王优哲, 王栋. 双磨粒划擦2D SiCf/SiC复合材料实验[J]. 金刚石与磨料磨具工程, 2025, 45(2): 153-162. doi: 10.13394/j.cnki.jgszz.2024.0044
GUO Jinzhu, LIU Yao, WANG Youzhe, WANG Dong. Experiment of double grits scribing 2D SiCf/SiC composite[J]. Diamond & Abrasives Engineering, 2025, 45(2): 153-162. doi: 10.13394/j.cnki.jgszz.2024.0044
Citation: GUO Jinzhu, LIU Yao, WANG Youzhe, WANG Dong. Experiment of double grits scribing 2D SiCf/SiC composite[J]. Diamond & Abrasives Engineering, 2025, 45(2): 153-162. doi: 10.13394/j.cnki.jgszz.2024.0044

双磨粒划擦2D SiCf/SiC复合材料实验

doi: 10.13394/j.cnki.jgszz.2024.0044
基金项目: 国家自然科学基金青年基金(51905498);太原市关键核心技术攻关“揭榜挂帅”项目课题(2024TYJB0128、2024TYJB0106)。
详细信息
    作者简介:

    郭晋竹,男,1989年生,硕士、高级工程师,硕士生导师。主要研究方向:半导体显示制程设备、硬脆材料加工。E-mail:18234146352@163.com

    通讯作者:

    刘瑶,男,1990年生,博士、副教授、硕士研究生导师。主要研究方向:精密加工与高端装备制造、生物医学制造与器械设计。 E-mail:Liuyao@nuc.edu.cn

  • 中图分类号: TQ164; TG58; TG74

Experiment of double grits scribing 2D SiCf/SiC composite

  • 摘要: 为揭示2D SiCf/SiC复合材料的磨削去除机理和磨粒间的耦合作用,在纤维编织表面(woven surface, WS)和叠加表面(stacking surface, SS)上,进行WS0、WS45和SS0、SS90方向的双磨粒划擦实验,观察划痕表面形貌,并测量划擦力。结果表明:横向纤维主要为剪切、拉伸和弯曲断裂;法向纤维以剪切去除为主,边缘伴随有少量的弯曲去除;纵向纤维的去除以拉伸(切入点)和弯曲(切出点)断裂为主,伴随有大量的纤维剥离;基体的去除形式有裂纹扩展、延性划痕、粉末化去除和脆性剥离。划擦力大小顺序为FSS0 > FWS45 > FSS90 > FWS0,在SS0时大量的基体被粉末化去除而消耗较多的能量,WS0时主要是横向纤维和纵向纤维的去除。与单颗磨粒实验对比,去除相同体积的材料,双磨粒的法向划擦力合力小于单颗磨粒划擦的法向划擦力合力,第1颗磨粒划擦后在表面形成的损伤导致第2颗磨粒去除相同体积材料时需要的能量降低,磨粒之间表现出较强的耦合关系,使2D SiCf/SiC复合材料磨削力降低的同时获得更好的表面质量。

     

  • 图  1  双磨粒划擦2D SiCf/SiC实验设置

    Figure  1.  Double grits scribing 2D SiCf/SiC experimental setup

    图  2  双磨粒划擦示意图

    Figure  2.  Double grits scribing schematic

    图  3  SiC纤维破坏形式

    Figure  3.  SiC fiber damage mode

    图  4  划擦前后磨粒表面形貌对比

    Figure  4.  Surface morphology comparison of grits before and after scribing

    图  5  WS0方向上划擦后表面形貌

    Figure  5.  Scribed surface morphology on WS0

    图  6  WS45方向上划擦后的表面形貌

    Figure  6.  Scribed surface morphology on WS45

    图  7  SS0方向上划擦后的表面形貌

    Figure  7.  Scribed surface morphology on SS0

    图  8  SS90方向上划擦后的表面形貌

    Figure  8.  Scribed surface morphology on SS90

    图  9  2D SiCf/SiC材料去除机理

    Figure  9.  2D SiCf/SiC material removal mechanism

    图  10  双磨粒划擦2D SiCf/SiC法向划擦力

    Figure  10.  Double grits scratching 2D SiCf/SiC normal scratching force

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出版历程
  • 收稿日期:  2024-03-10
  • 修回日期:  2024-03-22
  • 录用日期:  2024-03-27
  • 刊出日期:  2025-04-20

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