CN 41-1243/TG ISSN 1006-852X
Volume 36 Issue 6
Dec.  2016
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QIN Hongquan, WANG Yongsheng, LI Qing, CHEN Jiapeng, LIU Zhenhui, SU Jianxiu. Polishing slurry of chemical mechanical polishing SUS304 ultrathin stainless steel sheet[J]. Diamond & Abrasives Engineering, 2016, 36(6): 25-28,34. doi: 10.13394/j.cnki.jgszz.2016.6.0006
Citation: QIN Hongquan, WANG Yongsheng, LI Qing, CHEN Jiapeng, LIU Zhenhui, SU Jianxiu. Polishing slurry of chemical mechanical polishing SUS304 ultrathin stainless steel sheet[J]. Diamond & Abrasives Engineering, 2016, 36(6): 25-28,34. doi: 10.13394/j.cnki.jgszz.2016.6.0006

Polishing slurry of chemical mechanical polishing SUS304 ultrathin stainless steel sheet

doi: 10.13394/j.cnki.jgszz.2016.6.0006
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  • Rev Recd Date: 2016-10-03
  • Available Online: 2022-07-27
  • Flexible display has become a research hot spot as next generation display technology and stainless steel is one of the main materials of flexible large size display substrate. To realize a super-smooth no-damage surface on stainless steel,chemical mechanical polishing(CMP) is adopted. The influence of abrasive size and contents of dispersion agent,oxidant agent,abrasive and corrosion inhibitor agent on the material removal rate and the surface roughness of CMP 304 stainless steel had been studied by orthogonal tests. The results show that abrasive size has the most significant effect on the surface roughness,followed by contents of H2O2,glycerol,oxalic acid,abrasive in turn. The abrasive size has the maximum effect on the material removal rate,followed by contents of abrasive,glycerol,oxalic acid and H2O2.

     

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