CN 41-1243/TG ISSN 1006-852X
Volume 37 Issue 1
Feb.  2017
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WANG Liang, JIANG Caiyi, GUO Shenghui, GAO Jiyun, HU Tu, YANG Li, PENG Jinhui, ZHANG Libo. Properties of boron doped diamond films prepared by new type of boron source[J]. Diamond & Abrasives Engineering, 2017, 37(1): 7-12. doi: 10.13394/j.cnki.jgszz.2017.1.0002
Citation: WANG Liang, JIANG Caiyi, GUO Shenghui, GAO Jiyun, HU Tu, YANG Li, PENG Jinhui, ZHANG Libo. Properties of boron doped diamond films prepared by new type of boron source[J]. Diamond & Abrasives Engineering, 2017, 37(1): 7-12. doi: 10.13394/j.cnki.jgszz.2017.1.0002

Properties of boron doped diamond films prepared by new type of boron source

doi: 10.13394/j.cnki.jgszz.2017.1.0002
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  • Rev Recd Date: 2016-12-17
  • Available Online: 2022-07-12
  • Diamond films with different boron concentrations are prepared by using microwave plasma chemical vapor deposition with ethanol-boron-oxide solution as boron source.SEM, XRD, Raman spectroscopy and electrochemical work station were used to observe and study the surface morphology, crystal structure and electro-chemical properties of the film.Resultsshow that with the increase of boron concentration, crystalline size of diamond film first decreases and then increases, while the potential window decreases from 3.1 V to 2.6 V and the anodic current decreases from 0.022 7mA·cm-2 to 0.011 9 mA·cm-2.But such increase has almost no influence on background current and electro-chemical reversibility.

     

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