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Volume 42 Issue 4
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Article Navigation >  Diamond & Abrasives Engineering  > 2022  >  42(4): 488-494
YAN Qiusheng, CAI Zhihang, PAN Jisheng, HUANG Bei, ZENG Ziqin. Process and mechanism of magnetorheological variable gap dynamic pressure planarization finishing[J]. Diamond & Abrasives Engineering, 2022, 42(4): 488-494. doi: 10.13394/j.cnki.jgszz.2022.0004
Citation: YAN Qiusheng, CAI Zhihang, PAN Jisheng, HUANG Bei, ZENG Ziqin. Process and mechanism of magnetorheological variable gap dynamic pressure planarization finishing[J]. Diamond & Abrasives Engineering, 2022, 42(4): 488-494. doi: 10.13394/j.cnki.jgszz.2022.0004
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Process and mechanism of magnetorheological variable gap dynamic pressure planarization finishing

doi: 10.13394/j.cnki.jgszz.2022.0004

  • School of Mechanical and Engineering, Guangdong University of Technology, Guangzhou 510006, China

More Information
  • Received Date: 2022-01-28
  • Accepted Date: 2022-03-21
  • Rev Recd Date: 2022-03-21
    • Available Online: 2023-02-07
    Abstract
  • In order to improve the magnetorheological polishing efficiency of photoelectric wafer and realize its ultra smooth planarization, the magnetorheological variable gap dynamic pressure planarization method is proposed. The changes of material removal rate and surface roughness of sapphire wafer with processing time under different variable gap conditions are studied, and the magnetorheological variable gap dynamic pressure planarization finishing mechanism is analyzed. The results show that the axial low-frequency extrusion vibration is applied to the magnetorheological polishing fluid through the sapphire wafer, the polishing pressure changes dynamically, and the magnetorheological fluid produces extrusion strengthening effect, which significantly improves the polishing efficiency and polishing effect. Under the conditions of workpiece pressing speed of 1.0 mm/s, lifting speed of 3.5 mm/s and extrusion vibration amplitude of 1 mm, the surface roughness Ra of sapphire wafer decreased from 6.22 nm to 0.31 nm and the material removal rate was 5.52 nm/min. Compared with constant gap magnetorheological polishing, the surface roughness decreased by 66% and the material removal rate increased by 55%. Changing the moving speed of variable gap can regulate the flow field characteristics of magnetorheological fluid, and the appropriate workpiece pressing speed and workpiece lifting speed are conducive to improve the polishing efficiency and surface quality of workpiece.

     

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    • References(15)
  • [1]
    吉建伟, 山村和也, 邓辉. 面向单晶SiC原子级表面制造的等离子体辅助抛光技术 [J]. 物理学报,2021,70(6):74-86.

    JI Jianwei, KAZUYA Y, DENG Hui. Plasma-assisted polishing for atomic surface fabrication of single crystal SiC [J]. Acta Physica Sinica,2021,70(6):74-86.
    [2]
    杨超, 李福坤, 任婷, 等. 碳化硅晶圆的快速高质量复合加工方法 [J]. 光学学报,2020,40(13):141-146.

    YANG Chao, LI Fukun, REN Ting, et al. Fast and high quality composite processing method for silicon carbide wafers [J]. Acta Optica Sinica,2020,40(13):141-146.
    [3]
    余青, 刘德福, 陈涛. 单晶蓝宝石衬底晶片的化学机械抛光工艺研究 [J]. 表面技术,2017,46(3):253-261. doi: 10.16490/j.cnki.issn.1001-3660.2017.03.038

    YU Qing, LIU Defu, CHEN Tao. Chemico-mechanical polishing technique of monocrystal sapphire substrate wafer [J]. Surface Technology,2017,46(3):253-261. doi: 10.16490/j.cnki.issn.1001-3660.2017.03.038
    [4]
    WATANABE J, SUZUKI J, KOBAYASHI A. High precision polishing of semiconductor materials using hydrodynamic principle [J]. CIRP Annals Manufacturing Technology,1981,30(1):91-95. doi: 10.1016/S0007-8506(07)60902-0
    [5]
    舒谊, 周林, 解旭辉, 等. 离子束倾斜入射抛光对表面粗糙度的影响 [J]. 纳米技术与精密工程,2012,10(4):365-368. doi: 10.3969/j.issn.1672-6030.2012.04.016

    SHU Yi, ZHOU Lin, JIE Xuhui, et al. Impact of oblique incidence in ion beam figuring on surface roughness [J]. Nanotechnology and Precision Engineering,2012,10(4):365-368. doi: 10.3969/j.issn.1672-6030.2012.04.016
    [6]
    JACOBS S D, GOLINI D, HSU Y, et al. Magnetorheological finishing: A deterministic process for optics manufacturing: International conference on optical fabrication and testing [C]. Tokyo: International Society for Optics and Photonics, 1995.
    [7]
    KORDONSKI W, JACOBS S. Model of magnetorheological finishing [J]. Journal of Intelligent Material Systems & Structures,1996,7(2):131-137.
    [8]
    KORDONSKI W, GORODKIN S. Material removal in magnetorheological finishing of optics [J]. Applied Optics,2011,50(14):1984-1994. doi: 10.1364/AO.50.001984
    [9]
    WANG Y Q, YIN S H, HUANG H, et al. Magnetorheological polishing using a permanent magnetic yoke with straight air gap for ultra-smooth surface planarization [J]. Precision Engineering,2015,40:309-317. doi: 10.1016/j.precisioneng.2014.11.001
    [10]
    颜晓强, 王晗, 张嘉荣, 等. 小口径非球面小球头接触式抛光及磁流变抛光组合加工 [J/OL]. 表面技术, 2021: 1-15[2022-01-28]. http://kns.cnki.net/kcms/detail/50.1083.TG.20211208.2237.002.html.

    YAN Xiaoqiang, WANG Han, ZHANG Jiarong, et al. Combined process of small ball-end contact polishing and magnetorheological polishing for small aspheric surface [J/OL]. Surface Technology, 2021: 1-15[2022-01-28]. http://kns.cnki.net/kcms/detail/50.1083.TG.20211208.2237.002.html
    [11]
    陈丙三, 郑城, 黄迪程. SLM成型316L不锈钢磁流变抛光工艺试验研究 [J]. 工具技术,2021,55(10):82-86. doi: 10.3969/j.issn.1000-7008.2021.10.016

    CHEN Bingsan, ZHENG Cheng, HUANG Dicheng. Experimental study on magnetorheological polishing process of 316L stainless steel formed by SLM [J]. Tool Engineering,2021,55(10):82-86. doi: 10.3969/j.issn.1000-7008.2021.10.016
    [12]
    付有志, 路家斌, 阎秋生, 等. 磁流变动压复合抛光基本原理及力学特性 [J]. 表面技术,2020,49(4):55-63. doi: 10.16490/j.cnki.issn.1001-3660.2020.04.007

    FU Youzhi, LU Jiabin, YAN Qiusheng, et al. Basic principle and mechanical property of magnetorheological hydrodynamic compound polishing [J]. Surface Technology,2020,49(4):55-63. doi: 10.16490/j.cnki.issn.1001-3660.2020.04.007
    [13]
    TAO. Super-strong magnetorheological fluids [J]. Journal of Physics Condensed Matter,2001,13(50):R979-R999. doi: 10.1088/0953-8984/13/50/202
    [14]
    MAZLAN S A, ISSA A, CHOWDHURY H A, et al. Magnetic circuit design for the squeeze mode experiments on magnetorheological fluids [J]. Materials & Design,2009,30(6):1985-1993.
    [15]
    阎秋生, 廖博涛, 路家斌, 等. 集群磁流变变间隙动压平坦化加工试验研究 [J]. 机械工程学报,2021,57(19):230-238. doi: 10.3901/JME.2021.19.021

    YAN Qiusheng, LIAO Botao, LU Jiabin, et al. Experimental study on cluster magnetorheological variable gap dynamic pressure planarization finishing [J]. Journal of Mechanical Engineering,2021,57(19):230-238. doi: 10.3901/JME.2021.19.021
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