CN 41-1243/TG ISSN 1006-852X
XU Hao, SONG Enmin, BIAN Da, ZHAO Yongwu. Investigation of weak corrosion inhibitor for copper chemical mechanical polishing[J]. Diamond & Abrasives Engineering, 2021, 41(5): 32-39. doi: 10.13394/j.cnki.jgszz.2021.5.0006
Citation: XU Hao, SONG Enmin, BIAN Da, ZHAO Yongwu. Investigation of weak corrosion inhibitor for copper chemical mechanical polishing[J]. Diamond & Abrasives Engineering, 2021, 41(5): 32-39. doi: 10.13394/j.cnki.jgszz.2021.5.0006

Investigation of weak corrosion inhibitor for copper chemical mechanical polishing

doi: 10.13394/j.cnki.jgszz.2021.5.0006
More Information
  • Rev Recd Date: 2021-04-25
  • This study uses electrochemical, contact angle, chemical mechanical polishing and other experiments to study the effect of a new environmentally friendly potential copper corrosion inhibitor polyvinyl pyrrolidone(PVP). Experiment results show that PVP has a multi-purpose effect in copper chemical mechanical polishing. That mixing it with another environmentally friendly weak corrosion inhibitor TAZ ensures the flattening effect and environmental protection properties, and can achieve large removal of low pressure in industrial production. When the roughness is 2.28 nm, the removal rate can reach to 1 291 nm/min.

     

  • Cited by

    Periodical cited type(2)

    1. 贺斌,高宝红,霍金向,李雯浩宇,贺越,王建树. TAZ与LS-97对铜CMP协同缓蚀效应. 半导体技术. 2025(05): 473-480 .
    2. 张飞虎,王乙任,廖德锋,任乐乐,李琛. 光学元件全口径抛光中温度分布对元件面形的影响规律及其控制方法研究. 机械工程学报. 2022(15): 46-54 .

    Other cited types(6)

  • 加载中

Catalog

    通讯作者: 陈斌, bchen63@163.com
    • 1. 

      沈阳化工大学材料科学与工程学院 沈阳 110142

    1. 本站搜索
    2. 百度学术搜索
    3. 万方数据库搜索
    4. CNKI搜索

    Figures(8)  / Tables(3)

    Article Metrics

    Article views (622) PDF downloads(20) Cited by(8)
    Proportional views
    Related

    /

    DownLoad:  Full-Size Img  PowerPoint
    Return
    Return