Citation: | ZHANG Quanxin, LI Huping, SHI Junlong, SU Ai, CHEN Guiqing, XIE Hao, JIN Yupei, HU Guangshou. Preparation, microstructure and properties of LaCePr polishing slurry for optical glass CMP[J]. Diamond & Abrasives Engineering, 2024, 44(6): 816-824. doi: 10.13394/j.cnki.jgszz.2023.0225 |
[1] |
范娜, 陈传东, 于健飞, 等. 基于氟硅混酸制备稀土抛光粉及其抛光性能研究 [J]. 中国稀土学报,2024,42(1):1-10. doi: 10.1016/j.jre.2023.03.013
FAN Na, CHEN Chuandong, YU Jianfei, et al. Preparation of rare earth polishing powder based on fluorinated silica mixed acid and its polishing performance [J]. Chinese Journal of Rare Earth Sciences,2024,42(1):1-10. doi: 10.1016/j.jre.2023.03.013
|
[2] |
白亚雯. A向蓝宝石晶片化学机械抛光液组分优化及其抛光工艺研究 [D]. 无锡: 江南大学, 2018.
BAI Yawen. Study on the chemical mechanical polishing liquid and its process of A-plane sapphire wafer [D]. Wuxi: Jiangnan University, 2018.
|
[3] |
陈亮亮. CeO2抛光液悬浮分散性能的研究与改进 [D]. 上海: 华东理工大学, 2021.
CHEN Liangliang. Research and improvement on suspension and dispersion performance of CeO2 polishing solution [D]. Shanghai: East China University of Science and Technology, 2021.
|
[4] |
赵延. 手机曲面玻璃用稀土抛光浆料配制及抛光性能研究 [D]. 包头: 内蒙古科技大学, 2021.
ZHAO Yan. Study on preparation and polishing performance of rare earth polishing paste for mobile phone curved glass [D]. Baotou: Inner Mongolia University of Science and Technology, 2021.
|
[5] |
王学亮. 微纳米铈基抛光粉及浆料的制备与性能研究 [D]. 南昌: 南昌大学, 2022.
WANG Xueliang. Study on the preparation and properties of micro nano cerium based polishing powder and slurry [D]. Nanchang: Nanchang University, 2022.
|
[6] |
洪广言. 稀土抛光粉 [M]. 北京: 科学出版社, 2017.
HONG Guangyan. Rare earth polishing powder [M]. Beijing: Science Press, 2017.
|
[7] |
周薇, 常宏涛, 张存瑞, 等. 抛光浆料的组成对抛光性能的影响 [J]. 内蒙古科技大学学报,2020,39(2):39-42. doi: 10.16559/j.cnki.2095-2295.2020.02.008
ZHOU Wei, CHANG Hongtao, ZHANG Cunrui, et al. The influence of polishing slurry composition on polishing performance [J]. Journal of Inner Mongolia University of Science and Technology,2020,39(2):39-42. doi: 10.16559/j.cnki.2095-2295.2020.02.008
|
[8] |
戴蒙姣, 陈国美, 倪自丰, 等. 均一亚微米级氧化铈抛光粉的制备 [J]. 金刚石与磨料磨具工程,2022,42(4):428-432. doi: 10.13394/j.cnki.jgszz.2021.0117
DAI Mengjiao, CHEN Guomei, NI Zifeng, et al. Preparation of homogeneous submicron ceria polishing powder [J]. Diamond & Abrasives Engineering,2022,42(4):428-432. doi: 10.13394/j.cnki.jgszz.2021.0117
|
[9] |
赵延, 胡艳宏, 崔凌霄, 等. 稀土抛光粉沉降速度的研究 [J]. 内蒙古科技大学学报,2022,41(1):32-35. doi: 10.16559/j.cnki.2095-2295.2022.01.007
ZHAO Yan, HU Yanhong, CUI Lingxiao, et al. Study on the sedimentation rate of rare earth polishing powder [J]. Journal of Inner Mongolia University of Science and Technology,2022,41(1):32-35. doi: 10.16559/j.cnki.2095-2295.2022.01.007
|
[10] |
李欢欢. 稀土抛光粉抛光工艺的多目标稳健优化设计 [D]. 包头: 内蒙古科技大学, 2021.
LI Huanhuan. Multi objective robust optimization design of rare earth polishing powder polishing process [D]. Baotou: Inner Mongolia University of Science and Technology, 2021.
|
[11] |
刘志, 王辰伟, 周建伟, 等. STI CMP中SiO2/CeO2混合磨料对SiO2介质层CMP性能的影响 [J]. 半导体技术,2022,47(11):865-872. doi: 10.13290/j.cnki.bdtjs.2022.11.003
LIU Zhi, WANG Chenwei, ZHOU Jianwei, et al. Effects of SiO2/CeO2 mixed abrasives on the properties of SiO2 dielectric layer CMP in STI CMP [J]. Semiconductor Technology,2022,47(11):865-872. doi: 10.13290/j.cnki.bdtjs.2022.11.003
|
[12] |
胡浩, 李梅, 王觅堂, 等. 球磨法制备铈基稀土抛光粉及其抛光性能研究 [J]. 稀土,2019,40(5):47-54. doi: 10.16533/J.CNKI.15-1099/TF.201905007
HU Hao, LI Mei, WANG Mitang, et al. Preparation of cerium based rare earth polishing powder by ball milling method and its polishing performance [J]. Rare Earth,2019,40(5):47-54. doi: 10.16533/J.CNKI.15-1099/TF.201905007
|
[13] |
闫妹, 檀柏梅, 王亚珍, 等. CeO2磨料在介质化学机械抛光及后清洗中应用的研究进展 [J]. 稀土,2023,44(3):106-117. doi: 10.16533/j.cnki.15-1099/tf.20230007
YAN Mei, TAN Baimei, WANG Yazhen, et al. Research progress on the application of CeO2 abrasive in medium chemical mechanical polishing and post cleaning [J]. Rare Earth,2023,44(3):106-117. doi: 10.16533/j.cnki.15-1099/tf.20230007
|
[14] |
王也, 张保国, 吴鹏飞, 等. 用于光学玻璃CMP的高效稀土抛光液研究 [J]. 润滑与密封,2023,48(5):79-84. doi: 10.3969/j.issn.0254-0150.2023.05.012
WANG Ye, ZHANG Baoguo, WU Pengfei, et al. Research on high-efficiency rare earth polishing slurry for CMP of optical glass [J]. Lubrication Engineering,2023,48(5):79-84. doi: 10.3969/j.issn.0254-0150.2023.05.012
|
[15] |
任鹏. 3D玻璃抛光液的制备及其性能研究 [J]. 化工设计通讯,2020,46(4):159-160. doi: 10.3969/j.issn.1003-6490.2020.04.107
REN Peng. Preparation and performance study of 3D glass polishing fluid [J]. Chemical Design Communication,2020,46(4):159-160. doi: 10.3969/j.issn.1003-6490.2020.04.107
|
[16] |
邹兰梅. 氧化铈及其复合磨料的研究进展 [J]. 安徽化工,2021,47(1):13-16. doi: 10.3969/j.issn.1008-553X.2021.01.005
ZOU Lanmei. Study progress of cerium oxide and its composite abrasive [J]. Anhui Chemical Industry,2021,47(1):13-16. doi: 10.3969/j.issn.1008-553X.2021.01.005
|
[17] |
续晨, 周建伟, 王辰伟, 等. 柠檬酸对CeO2磨料分散稳定性及抛光性能的影响 [J]. 半导体技术,2022,47(2):111-116. doi: 10.13290/j.cnki.bdtjs.2022.02.006
XU Chen, ZHOU Jianwei, WANG Chenwei, et al. The effect of citric acid on the dispersion stability and polishing performance of CeO2 abrasives [J]. Semiconductor Technology,2022,47(2):111-116. doi: 10.13290/j.cnki.bdtjs.2022.02.006
|
[18] |
许宁, 马家辉, 刘琦. CeO2基磨粒在化学机械抛光中的研究进展 [J]. 中国稀土学报,2022,40(2):181-193. doi: 10.11785/S1000-4343.20220202
XU Ning, MA Jiahui, LIU Qi. Research progress of CeO2 based abrasive particles in chemical mechanical polishing [J]. Chinese Journal of Rare Earths,2022,40(2):181-193. doi: 10.11785/S1000-4343.20220202
|
[19] |
杨朝霞, 张保国, 阳小帆, 等. 高分散稳定性CeO2抛光液的制备及其抛光性能研究 [J]. 稀土,2022,43(2):128-136. doi: 10.16533/J.CNKI.15-1099/TF.202202015
YANG Zhaoxia, ZHANG Baoguo, YANG Xiaofan, et al. Preparation and polishing performance of highly dispersed and stable CeO2 polishing solution [J]. Rare Earth,2022,43(2):128-136. doi: 10.16533/J.CNKI.15-1099/TF.202202015
|
[20] |
姜晨, 洪小兰, 时培兵, 等. 六偏磷酸钠对磁性复合流体分散性及光学玻璃抛光性能的影响 [J]. 稀土,2020,41(2):47-55. doi: 10.16533/J.CNKI.15-1099/TF.20200005
JIANG Chen, HONG Xiaolan, SHI Peibing, et al. The effect of sodium hexametaphosphate on the dispersity of magnetic composite fluid and the polishing performance of optical glass [J]. Rare Earth,2020,41(2):47-55. doi: 10.16533/J.CNKI.15-1099/TF.20200005
|
[21] |
李学舜. 稀土碳酸盐制备铈基稀土抛光粉的研究 [D]. 沈阳: 东北大学, 2008.
LI Xueshun. Study on the preparation of cerium based rare earth polishing powder using rare earth carbonate [D]. Shenyang: Northeast University, 2008.
|
[22] |
陈义. 镍基单晶高温合金中Re-W合金化的关联及其对γ'-Ni3Al相的协同强韧化作用分析 [D]. 长沙: 湖南大学, 2019.
CHEN Yi. Correlation of Re-W alloying in nickel based single crystal high-temperature alloys and its impact on γ'- Ni3Al analysis of the synergistic toughening effect of phase [D]. Changsha: Hunan University, 2019.
|
[23] |
杨小海, 李安, 宫慧勇, 等. 不同沉淀剂制备氧化铈抛光粉 [J]. 铜业工程,2023,18(2):86-91. doi: 10.3969/j.issn.1009-3842.2023.02.012
YANG Xiaohai, LI An, GONG Huiyong, et al. Preparation of cerium oxide polishing powder with different precipitants [J]. Copper Engineering,2023,18(2):86-91. doi: 10.3969/j.issn.1009-3842.2023.02.012
|
[1] | YAN Jiewen, LU Jiabin, HUANG Yinli, PAN Jisheng, YAN Qiusheng. Fenton reaction chemical mechanical polishing liquid composition optimization of polishing GaN wafer[J]. Diamond & Abrasives Engineering, 2022, 42(5): 610-616. doi: 10.13394/j.cnki.jgszz.2022.5001 |
[2] | DAI Mengjiao, CHEN Guomei, NI Zifeng, ZHANG Ping, QIAN Shanhua, BIAN Da. Preparation of homogeneous sub-micron cerium oxide polishing powder[J]. Diamond & Abrasives Engineering, 2022, 42(4): 428-432. doi: 10.13394/j.cnki.jgszz.2021.0117 |
[3] | CHEN Guomei, DU Chunkuan, NI Zifeng, BIAN Da, WANG Hao, ZHANG Ping, ZHANG Xin. Effect of complexing agent on chemical-mechanical polishing effect of 316L stainless steel[J]. Diamond & Abrasives Engineering, 2022, 42(6): 753-759. doi: 10.13394/j.cnki.jgszz.2022.0047 |
[4] | LIU Haixu, WU Qingdong, CAO Xiaojun, QI Wanting, SU Jianxiu. Prediction and optimization of process parameters in chemical mechanical polishing for 304 stainless steel based on response surface methodology[J]. Diamond & Abrasives Engineering, 2021, 41(2): 89-95. doi: 10.13394/j.cnki.jgszz.2021.2.0015 |
[5] | WANG Hao, CHEN Guomei, NI Zifeng, QIAN Shanhua, BIAN Da, ZHAO Yongwu. Effect of 1, 2, 4 -triazole and benzotriazole on chemical-mechanical polishing of 316L stainless steel[J]. Diamond & Abrasives Engineering, 2021, 41(1): 83-88. doi: 10.13394/j.cnki.jgszz.2021.1.0014 |
[6] | ZHANG Zili, JIN Zhuji, MU Qing, YANG Huipeng, HAN Xiaolong. Optimization of CMP solution for yttrium aluminum garnet crystal[J]. Diamond & Abrasives Engineering, 2021, 41(2): 82-88. doi: 10.13394/j.cnki.jgszz.2021.2.0014 |
[7] | ZHU Yuguang, WANG Yongguang, NIU Shiwei, XIE Yujun, LEI Xiangyu. Effect of environmental friendly complexing agent and oxidant on CMP of aluminium alloy under low pressure[J]. Diamond & Abrasives Engineering, 2020, 40(1): 74-78. doi: 10.13394/j.cnki.jgszz.2020.1.0012 |
[8] | DENG Jiayun, PAN Jisheng, ZHANG Qixiang, GUO Xiaohui, YAN Qiusheng. Research progress in chemical mechanical polishing of single crystal SiC substrates[J]. Diamond & Abrasives Engineering, 2020, 40(1): 79-91. doi: 10.13394/j.cnki.jgszz.2020.1.0013 |
[9] | XU Jiahui, KANG Renke, DONG Zhigang, WANG Ziguang. Review on chemical mechanical polishing of silicon wafers[J]. Diamond & Abrasives Engineering, 2020, 40(4): 24-33. doi: 10.13394/j.cnki.jgszz.2020.4.0004 |
[10] | WAN Ce, JIN Zhuji, WU Di, LIU Zuotao, SI Likun. Chemical mechanical planarization of copper sheet with high radius-thickness ratio[J]. Diamond & Abrasives Engineering, 2018, 38(3): 81-85. doi: 10.13394/j.cnki.jgszz.2018.3.0016 |
[11] | LIU Zhenhui, CHEN Shaokun, PENG Yanan, LI Jiejing, SU Jianxiu. Compositions of slurry used in chemical-mechanically polishing 304 stainless steel[J]. Diamond & Abrasives Engineering, 2018, 38(2): 78-81,88. doi: 10.13394/j.cnki.jgszz.2018.2.0016 |
[12] | MENG Xinxin, LIN Youxi, REN Zhiying. Surface quality of grinding optical glasses using eletroplated diamond wheel[J]. Diamond & Abrasives Engineering, 2017, 37(3): 91-95. doi: 10.13394/j.cnki.jgszz.2017.3.0018 |
[13] | BAI Linshan, WANG Jinpu, CHU Xiangfeng. Mechanism and optimization of chemical-mechanically polishing ceramic glass substrate with CeO_2 slurry[J]. Diamond & Abrasives Engineering, 2017, 37(2): 1-5,10. doi: 10.13394/j.cnki.jgszz.2017.2.0001 |
[14] | CHEN Jiang, ZHANG Feihu. Research on sub-surface crack depth in surface grinding for optical glass K9 based on grinding speed[J]. Diamond & Abrasives Engineering, 2016, 36(4): 13-17. doi: 10.13394/j.cnki.jgszz.2016.4.0003 |
[15] | DAI Hengzhen, YOU Yanhong, DAI Zhihong, JIN Zhuji. Chemical-mechanical grinding of K9 optical glass using atomized liquid[J]. Diamond & Abrasives Engineering, 2016, 36(4): 6-12. doi: 10.13394/j.cnki.jgszz.2016.4.0002 |
[16] | WANG Jinpu, BAI Linshan, CHU Xiangfeng. Investigation on the chemical mechanical polishing of A-plane sapphire[J]. Diamond & Abrasives Engineering, 2016, 36(3): 43-49. doi: 10.13394/j.cnki.jgszz.2016.3.0009 |
[17] | LI Qing, CHEN Shaokun, PENG Yanan, QIN Hongquan, FU Sufang, SU Jianxiu. Chemical mechanical polishing process parameters of 304 stainless steel[J]. Diamond & Abrasives Engineering, 2016, 36(5): 21-25. doi: 10.13394/j.cnki.jgszz.2016.5.0004 |
[18] | CHEN Jiapeng, CHEN Shaokun, LI Qing, QIN Hongquan, SU Jianxiu. Study on chemical mechanical polishing of 304 stainless steel sheet based on alkaline polishing slurry[J]. Diamond & Abrasives Engineering, 2016, 36(2): 6-9,23. doi: 10.13394/j.cnki.jgszz.2016.2.0002 |
[19] | YUAN Zewei, DU Haiyang, HE Yan, ZHANG Yue. Preparation of slurry for photocatalytic assisted chemical mechanical polishing CVD diamond[J]. Diamond & Abrasives Engineering, 2016, 36(5): 15-20,31. doi: 10.13394/j.cnki.jgszz.2016.5.0003 |
[20] | QIN Hongquan, WANG Yongsheng, LI Qing, CHEN Jiapeng, LIU Zhenhui, SU Jianxiu. Polishing slurry of chemical mechanical polishing SUS304 ultrathin stainless steel sheet[J]. Diamond & Abrasives Engineering, 2016, 36(6): 25-28,34. doi: 10.13394/j.cnki.jgszz.2016.6.0006 |